Oxygen-induced high-k dielectric degradation in TiN/Hf-based high-k gate stacks - I-Scover metadata
ARTICLE

Oxygen-induced high-k dielectric degradation in TiN/Hf-based high-k gate stacks

Metadata details

now loading...

Related ARTICLE(s)

now loading...

Related metadata

now loading...

Search by external websites

now loading...

Login 日本語