Microsecond Melting and Crystallization of Silicon Films Induced by Atmospheric Pressure Thermal Plasma Jet Irradiation and Its Application to Thin Film Transistor Fabrication - I-Scover metadata
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Microsecond Melting and Crystallization of Silicon Films Induced by Atmospheric Pressure Thermal Plasma Jet Irradiation and Its Application to Thin Film Transistor Fabrication

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